Application: The RF/DC magnetron sputtering system is a versatile thin-film deposition tool designed for precise material coating in research applications with 4 magnetrons. It operates using both RF and DC power sources, enabling the controlled deposition of conductive and non-conductive materials. This system is ideal for fabricating high-quality thin films with uniform thickness. Its advanced process control allows researchers and engineers to optimise parameters such as deposition rate, plasma density, and film composition, making it suitable for applications in electronics, optics, and material science. SPECIFICATIONS Deposition Modes: RF and DC. Deposition Features: Reactive and monolayer sputtering is possible.